JPH0432377B2 - - Google Patents

Info

Publication number
JPH0432377B2
JPH0432377B2 JP57125757A JP12575782A JPH0432377B2 JP H0432377 B2 JPH0432377 B2 JP H0432377B2 JP 57125757 A JP57125757 A JP 57125757A JP 12575782 A JP12575782 A JP 12575782A JP H0432377 B2 JPH0432377 B2 JP H0432377B2
Authority
JP
Japan
Prior art keywords
image
photosensitive layer
exposed
silicone rubber
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57125757A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5917552A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP57125757A priority Critical patent/JPS5917552A/ja
Priority to US06/514,963 priority patent/US4496647A/en
Priority to EP83107123A priority patent/EP0100938B1/en
Priority to CA000432855A priority patent/CA1243880A/en
Priority to DE8383107123T priority patent/DE3381650D1/de
Publication of JPS5917552A publication Critical patent/JPS5917552A/ja
Publication of JPH0432377B2 publication Critical patent/JPH0432377B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP57125757A 1982-07-21 1982-07-21 画像形成用積層体の処理方法 Granted JPS5917552A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP57125757A JPS5917552A (ja) 1982-07-21 1982-07-21 画像形成用積層体の処理方法
US06/514,963 US4496647A (en) 1982-07-21 1983-07-18 Treatment of image-forming laminated plate
EP83107123A EP0100938B1 (en) 1982-07-21 1983-07-20 Treatment of image-forming laminated plate
CA000432855A CA1243880A (en) 1982-07-21 1983-07-20 Treatment of image-forming laminated plate
DE8383107123T DE3381650D1 (de) 1982-07-21 1983-07-20 Behandlung einer bilderzeugenden verbundplatte.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57125757A JPS5917552A (ja) 1982-07-21 1982-07-21 画像形成用積層体の処理方法

Publications (2)

Publication Number Publication Date
JPS5917552A JPS5917552A (ja) 1984-01-28
JPH0432377B2 true JPH0432377B2 (en]) 1992-05-29

Family

ID=14918057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57125757A Granted JPS5917552A (ja) 1982-07-21 1982-07-21 画像形成用積層体の処理方法

Country Status (5)

Country Link
US (1) US4496647A (en])
EP (1) EP0100938B1 (en])
JP (1) JPS5917552A (en])
CA (1) CA1243880A (en])
DE (1) DE3381650D1 (en])

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6028654A (ja) * 1983-07-27 1985-02-13 Toray Ind Inc 湿し水不要平版印刷版の製版方法
JPS60169852A (ja) * 1984-02-14 1985-09-03 Fuji Photo Film Co Ltd 湿し水不要ネガ型感光性平版印刷版の製版法
JPS60192948A (ja) * 1984-03-14 1985-10-01 Fuji Photo Film Co Ltd 湿し水不要ネガ型感光性平版印刷版および製版方法
US5066561A (en) * 1984-06-11 1991-11-19 Hoechst Celanese Corporation Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US5143814A (en) * 1984-06-11 1992-09-01 Hoechst Celanese Corporation Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate
US4802740A (en) * 1985-02-13 1989-02-07 Canon Kabushiki Kaisha Liquid crystal alignment layer containing polyvinyl-alcohol and titanium-alkoxide
GB2171530B (en) * 1985-02-27 1989-06-28 Imtec Products Inc Method of producing reversed photoresist images by vapour diffusion
CA1285418C (en) * 1985-07-18 1991-07-02 Robert A. Owens Pre-exposure method for increased sensitivity in high contrast resist development
JPS6235350A (ja) * 1985-08-07 1987-02-16 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 像反転に有用な保存寿命の長いフオトレジスト
CA1321315C (en) * 1986-04-11 1993-08-17 Yoichi Mori Printing plate
US4826752A (en) * 1986-06-25 1989-05-02 Fuji Photo Film Co., Ltd. Dry photosensitive lithographic plate comprising a silicon rubber layer containing an aromatic aminosilane
JP2507341B2 (ja) * 1986-08-22 1996-06-12 東レ株式会社 水なし平版印刷版用現像液
DE3628720A1 (de) * 1986-08-23 1988-02-25 Hoechst Ag Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck
DE3628719A1 (de) * 1986-08-23 1988-02-25 Hoechst Ag Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck
GB8628613D0 (en) * 1986-11-29 1987-01-07 Horsell Graphic Ind Ltd Developing fluid for lithographic plates
JPS63214757A (ja) * 1987-03-04 1988-09-07 Toray Ind Inc 水なし平版印刷版の製版方法
US4902603A (en) * 1987-10-05 1990-02-20 Olin Corporation Photoresist compositions containing selected 6-acetoxy cyclohexadienone photosensitizers and novolak resins
KR890007398A (ko) * 1987-10-29 1989-06-19 다니이 아끼오 패턴 형성방법
US5019488A (en) * 1988-09-29 1991-05-28 Hoechst Celanese Corporation Method of producing an image reversal negative photoresist having a photo-labile blocked imide
EP0451311B1 (de) * 1990-04-12 1999-03-10 Siemens Aktiengesellschaft Verfahren zur Erzeugung einer Resiststruktur
DE4039920A1 (de) * 1990-12-14 1992-06-17 Basf Ag Neue polyethylenimin- und polyvinylamin-derivate, mit diesen derivaten beschichtete traegermaterialien auf der basis von aluminium sowie deren verwendung zur herstellung von offsetdruckplatten
US5866294A (en) * 1993-10-26 1999-02-02 Toray Industries, Inc. Water-less quinonediazide lithographic raw plate
AU680700B2 (en) * 1993-10-26 1997-08-07 Toray Industries, Inc. Dry lithographic forme
US6231715B1 (en) * 1994-12-20 2001-05-15 Kimberly-Clark Worldwide, Inc. Elongate, semi-tone printing process
JPH0980746A (ja) * 1995-09-14 1997-03-28 Fuji Photo Film Co Ltd 湿し水不要平版印刷版
ATE239928T1 (de) * 1995-11-10 2003-05-15 Toray Industries Verwendung einer flüssigkeit zur herstellung einer trockenflachdruckplatte
EP1038669B1 (en) 1999-03-26 2005-01-26 Toray Industries, Inc. Method of producing directly imageable waterless planographic printing plate
EP1432857A1 (en) * 2001-09-07 2004-06-30 Borden Chemical, Inc. Coated optical fibers using adhesion promoters, and methods for making and using same
DE102005050226A1 (de) * 2005-10-20 2007-04-26 Man Roland Druckmaschinen Ag Metalldrucktuch
KR101390605B1 (ko) * 2006-09-25 2014-04-29 히타치가세이가부시끼가이샤 감방사선성 조성물, 실리카계 피막의 형성방법, 실리카계 피막, 실리카계 피막을 구비하는 장치 및 부재, 및 절연막용 감광제

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE865108C (de) * 1949-09-14 1953-01-29 Kalle & Co Ag Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen
GB1146618A (en) * 1965-10-11 1969-03-26 Harry Frank Gipe Method for preparing photo-lithographic plates
US3511178A (en) * 1967-01-06 1970-05-12 Minnesota Mining & Mfg Printing plate and method
JPS5426923B2 (en]) * 1972-03-21 1979-09-06
JPS5522781B2 (en]) * 1972-05-09 1980-06-19
JPS5612860B2 (en]) * 1972-10-05 1981-03-25
JPS5421089B2 (en]) * 1973-05-29 1979-07-27
JPS5418305A (en) * 1977-07-08 1979-02-10 Toray Industries Method of making nonnwater flat printing plate
CA1120763A (en) * 1977-11-23 1982-03-30 James A. Carothers Enhancement of resist development
JPS5555344A (en) * 1978-10-20 1980-04-23 Toray Ind Inc Lithographic printing plate
GB2034911B (en) * 1978-10-26 1983-02-09 Toray Industries Dry planographic printing plate
JPS5559466A (en) * 1978-10-26 1980-05-02 Toray Ind Inc Lithographic printing plate without requiring dampening water
US4250242A (en) * 1978-10-31 1981-02-10 American Hoechst Corporation Uniform exposure of positive-acting diazo type materials through support
CA1155707A (en) * 1979-08-06 1983-10-25 Robert F Gracia Lithographic printing plate and process
JPS5680046A (en) * 1979-12-05 1981-07-01 Toray Ind Inc Lithographic plate requiring no dampening water and its manufacture
US4342820A (en) * 1980-12-10 1982-08-03 Toray Industries, Inc. Dry planographic printing plate and preparation thereof
JPS57205740A (en) * 1981-06-15 1982-12-16 Toray Ind Inc Method for fixing negative type lithographic plate requiring no dampening water

Also Published As

Publication number Publication date
DE3381650D1 (de) 1990-07-19
EP0100938B1 (en) 1990-06-13
EP0100938A3 (en) 1985-08-21
JPS5917552A (ja) 1984-01-28
CA1243880A (en) 1988-11-01
EP0100938A2 (en) 1984-02-22
US4496647A (en) 1985-01-29

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